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Issue Date Title Author(s) Journal View
2014-07-01
The effects of nitrogen incorporation on the properties of atomic layer deposited Ru thin films as a direct-plateable diffusion barrier for Cu interconnect

Mun, Ki-Yeung ;  Hong, Tae Eun ;  Cheon, Taehoon ;  Jang, Yujin ;  Lim, Byoung-Yong ;  Kim, Sunjung ;  Kim, Soo-Hyun

Thin Solid Films, v.562, pp.118 - 125, 2014-07-01

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